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School of Engineering Ph.D., University of Illinois M.S., University of Basel, Switzerland B.S., University of Basel, Switzerland Professor Gall received his Diploma from the University of Basel, Switzerland, in 1994, and his Ph.D. from the University of Illinois at Urbana-Champaign in 2000. Prof. Gall has been a Visiting Scientist at the Frederick Seitz Materials Research Laboratory, Illinois, has served as Assistant Editor and Editorial Board Member for Thin Solid Films, and as Associate Editor for the Journal of Vacuum Science and Technology A. He is the elected secretary of the AVS Advanced Surface Engineering Division and serves as session chair, program committee chair, and proceedings editor for the International Conference for Metallurgical Coatings and Thin Films and the AVS International Symposium.
Read More: http://www.rpi.edu/~galld
Thin film and nanostructure growth from the vapor phase, with particular focus on the atomic-level processes that control surface diffusion, growth kinetics, and microstructural evolution. Atomic shadowing and ion-surface interactions are exploited to design nanostructures with applications as sensors, electronic materials, self-lubricious hard coatings, and energy conversion devices.
Contact:
Materials Research Center
rm: 204
110 8th Street
Troy, New York
12180
Daniel Gall
Associate Professor
http://www.rpi.edu/~galld
Department Affiliation:
Department of Materials Science & Engineering
Education:
Physics
Physics
PhysicsBackground:
Research Interests: