Stephan Mueller
Adjunct Professor
Contact & Personal Information
Mailing Address:
Materials Research Center
rm: 140
110 8th Street
Troy, New York
12180
Education
Ph.D., Friedrich-Alexander-University Erlangen-Nuremberg, Germany
Materials Science
M.S., Friedrich-Alexander-University Erlangen-Nuremberg, Germany
Physics and Physical Chemistry
Professional Background
March 2007 – today: Crystal-IS (Green Island NY), Current position: Vice President Engineering
August 2003 – today: Adjunct Professor in the Department of Materials Science and Engineering, NC-State University (Raleigh, NC)
April 1998 – March 2007: Cree, Inc. (Durham NC), Last position: Principal Scientist
September 1993 – February1998: Scientist at the Materials Science Institute VI, University of Erlangen-Nuremberg, Germany
Research Bio
Vapor growth of compound semiconductors (SiC, GaN, AlN)
· Development of wide bandgap substrates for high power and high frequency semiconductor devices and optoelectronic applications by PVT (Physical Vapor Transport) and HVPE (Hydride Vapor Phase Epitaxy) (demonstrated several world records of low defect densities in SiC substrates; developed 1st high purity semi-insulating 4H-SiC substrate)
· Simulation of heat and mass transfer for PVT and HVPE processes; Evaluation of the thermoelastic stress during growth
· Process implementation and control on an industrial scale (responsible for the process transfer from R&D to volume production for the fabrication of commercial wafer products, supporting a ~ 400 million dollar/year semiconductor device business)
Characterization of compound semiconductors
· Point defects: electrical and optical properties, many body effects, compensation mechanisms, thermal conductivity (Experience with the following characterization techniques: Hall-effect, CV, DLTS, EPR, [time dependent-] low temperature photoluminescence, optical absorption etc.); Significant contributions to clarify the fundamental role of intrinsic defects in the compensation mechanism in high purity semiinsulating SiC
· Dislocations: structure and generation mechanisms, effect on semiconductor device properties (Experience with the following characterization techniques: Synchrotron White Beam X-ray Topography, AFM, Stress Birefringence, Optical Emission Microscopy, Etching etc.)
Influence of material properties on semiconductor device performance
· Degradation mechanisms of high power and high frequency devices (Significant contributions to eliminate the Vf-Drift in SiC p-i-n diodes)
· Trapping effects in high frequency devices (Significant contributions to eliminate back-gating and trapping in SiC MESFETs)
Theoretical work on the physical properties of compound semiconductors
· Carrier mobility / scattering mechanisms, hopping
· Thermal conductivity
· Metal-Insulator Transition (MIT)
· Impurity bands in semiconductors (Efros-Model, Wigner crystallization)
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Related Websites:
- Materials Research Society
- The Minerals, Metals & Materials Society
- ASM International
- The Electrochemical Society
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Contact Us
Marcia Hartnett, Administrative Assistant
Phone: (518) 276-6941
Email: hartnm2@rpi.edu
Mailing Address:
Jonsson Engineering Center
rm: 4049
110 8th Street
Troy, New York
12180


